Automatic photoresist coating device (spin coater) Coater
This is a coater with minimal in-plane uniformity of the resist film and small differences in average film thickness between wafers. It supports low to high viscosity resist (up to 10,000 cP)!
This is a fully automated resist coating device using robot transport. It features high uniformity, reduced chemical usage, and the ability to use multiple chemicals. We can customize it to meet specifications for low to high viscosity resists. We have a proven track record with a variety of chemicals, including positive and negative resists, polyimide, SOG, wax, and silicone. We also have extensive experience in transporting various substrates such as Si (silicon), GaAs, InP, GaN, SiC, sapphire, ceramics, and SiO2 (glass). We have numerous achievements in transporting thin substrates like GaAs (thickness 150um), InP (thickness 150um), and LT (thickness 120um)! Since we handle everything from design to manufacturing and sales in-house, we have achieved low prices! 【Features】 - High uniformity of film thickness distribution through the spin process - Compatible with wafer sizes from 2 to 12 inches - Supports low to high viscosity (1.7cP to 10000cP) - Automatic wafer size detection function - Proven track record with a variety of chemicals - Reduced footprint (space-saving) - Numerous options for resist reduction - Lineup tailored to production volume We have a demo setup available, so please consider scheduling a demonstration first!
- Company：エイ・エス・エイ・ピイ
- Price：Other
